セミコンダクタ

アドバンスドエナジー(Advanced Energy)は、セミコンダクタ生産に用いられる高度技術製造プロセスに不可欠な技術の開発とサポートで世界をリードする企業です。精密性と柔軟性に富む当社の電源システム、信頼性の高いガスおよび液体のフローマネジメント(流量制御)システム、ならびに正確な温度計測器はすべて、成膜・成長(PVD、CVD、電気メッキ、ALD)、化学的除去(エッチング、ストリップ、CMP)、表面処理プロセス(イオン注入、RTP)を含む多段階のセミコンダクタデバイス製造に使用されています。

 

電源システム

 

Source Technology

 

Thermal Instrumentation

 

March 26, 2008 - Advances in Radio Frequency Plasma Power Delivery Systems presentation

 

June 27, 2006 - AE Unveils New Line of Sekidenko Multi-Channel OFTs and Emissometers

 

May 16, 2006 - AE Awarded Design Win by Leading Provider 

 
Arc Handling in RF-Superimposed DC Processes (2006) white paper


Overview of the Use of Copper Interconnects in the Semiconductor Industry (2004) white paper


Performance Considerations of High-Power AC Plasma Deposition Power Supplies (2004) white paper 

 

Power Supply Topologies (1999) white paper


Beyond Pressure Transients: Using Pressure-Insensitive MFCs to Control Gases In Semiconductor Manufacturing, March 2006 magazine reprint

 

Powering to better yields, November 2005 magazine reprint

Power Conversion and Control Reduces CoO and Improves Yield, March 2005 magazine reprint

Maximizing tool uptime and process stability through an RF system upgrade, November 2004 magazine reprint

Fabs can ride through voltage sags with power-quality targets, July 2004 magazine reprint

A Novel Frequency-Domain Small-Signal Analysis of Resonant Power Converters, July 2004 magazine reprint

Partial Pressure Control in Reactive Sputtering, June 2004 magazine reprint

 

A Novel Pulsed Supply With Arc Handling and Leading Edge Control, April 2004 magazine reprint

High Power Pulsed Reactive Sputtering of Zirconium Oxide and Tantalum Oxide, April 2004 magazine reprint

Reactive Sputter Deposition of Aluminum Oxide Coatings, April 2004 magazine reprint

Effective Closed-Loop Control for Reactive Sputtering Using Two Reactive Gases, April 2004 magazine reprint

Stabilizing RF Generator and Plasma Interactions, April 2004 magazine reprint

 

Optimising performance by integrating RF power and match technologies, Dec 2007/Jan 2008 magazine reprint

 

Used Equipment data sheet


 

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