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Advanced Energy^® Unveils its Newest Process-Power Platform:  The Paramount^™ RF Power-Delivery System

Breakthrough RF technology keeps pace-in real time-with the most abrupt plasma-impedance changes, enabling faster transitions, shorter process steps and reduced process times

FORT COLLINS, Colo., July 3, 2007--Advanced Energy^® Industries, Inc. (NasdaqGM: AEIS) today announced its newest power platform: the Paramount^™RF-power delivery system. Featuring unprecedented power-deliveryaccuracy and control for increasingly complex film stacks and finefeature sizes, the 3 kW Paramount system is well suited for both etchand deposition processes in semiconductor, FPD, MEMS and solarphotovoltaic manufacturing. AE^® will highlight the new Paramount platform during SEMICON^® West 2007, to be held July 17-19 at San Francisco’s Moscone Convention Center.

Next-generationdevice fabrication processes feature anti-reflective coatings, hardmasks, cap layers and stop layers in their recipes. Process designersmust account for these layers while at the same time accurately etch ordeposit the primary layer that may comprise multiple compositions anddoping profiles. The Paramount platform easily accommodates thesecomplexities with ultra-accurate power control and delivery across thefull output range—both on and off 50 Ω—for seamless process transitionsin etch, strip, PECVD, HDP-CVD, PVD and PEALD. Where pulsing isrequired to enable next-generation process steps, the Paramountsystem’s optional pulse and pulse synchronization features offer thewidest pulse-frequency range available.

Hans Betz, president andCEO of AE noted, “The Paramount system continues AE’s tradition ofenabling process-power innovation. This new platform has alsofacilitated AE’s continued, technical collaboration with our valued OEMcustomers. Paramount systems are already installed on next-generationetch platforms at major OEMs worldwide.” 

The Paramount RFpower-delivery system raises the bar for RF power products—offering thefinest control in the industry, with breakthrough performance andtechnology. This half-rack, 3 kW RF power supply’s impedancemeasurement rivals the accuracy of a network analyzer, enablingunprecedented power delivery accuracy and control at 13.56 MHz fixed orvariable frequencies. Able to keep pace—in real time—with the mostabrupt plasma-impedance changes, the Paramount system enables fastertransitions, shorter process steps and reduced process times, whileoptional frequency tuning performs virtually instantaneously (withinmsec)—faster than any other product on the market. The result is trulyunprecedented accuracy, repeatability and process control—for 50 Ω andnon-50 Ω loads.

To learn more about AE’s new line of ParamountRF power systems during SEMICON West, visit the company in booth #2202in the South Hall at Moscone Convention Center in San Francisco andvisit www.advanced-energy.co.jp/jp/Paramount.html. Editors interested inmeeting with AE during the show may contact Angie Kellen by phone:650.968.8900 x120, or email: akellen@mcapr.com.

Advanced Energy^® Industries, Inc. (NasdaqGM: AEIS) today announced its newest power platform: the Paramount^™RF-power delivery system. Featuring unprecedented power-deliveryaccuracy and control for increasingly complex film stacks and finefeature sizes, the 3 kW Paramount system is well suited for both etchand deposition processes in semiconductor, FPD, MEMS and solarphotovoltaic manufacturing. AE^® will highlight the new Paramount platform during SEMICON^® West 2007, to be held July 17-19 at San Francisco’s Moscone Convention Center.

Next-generationdevice fabrication processes feature anti-reflective coatings, hardmasks, cap layers and stop layers in their recipes. Process designersmust account for these layers while at the same time accurately etch ordeposit the primary layer that may comprise multiple compositions anddoping profiles. The Paramount platform easily accommodates thesecomplexities with ultra-accurate power control and delivery across thefull output range—both on and off 50 Ω—for seamless process transitionsin etch, strip, PECVD, HDP-CVD, PVD and PEALD. Where pulsing isrequired to enable next-generation process steps, the Paramountsystem’s optional pulse and pulse synchronization features offer thewidest pulse-frequency range available.

Hans Betz, presidentand CEO of AE noted, “The Paramount system continues AE’s tradition ofenabling process-power innovation. This new platform has alsofacilitated AE’s continued, technical collaboration with our valued OEMcustomers. Paramount systems are already installed on next-generationetch platforms at major OEMs worldwide.” 

The Paramount RFpower-delivery system raises the bar for RF power products—offering thefinest control in the industry, with breakthrough performance andtechnology. This half-rack, 3 kW RF power supply’s impedancemeasurement rivals the accuracy of a network analyzer, enablingunprecedented power delivery accuracy and control at 13.56 MHz fixed orvariable frequencies. Able to keep pace—in real time—with the mostabrupt plasma-impedance changes, the Paramount system enables fastertransitions, shorter process steps and reduced process times, whileoptional frequency tuning performs virtually instantaneously (withinmsec)—faster than any other product on the market. The result is trulyunprecedented accuracy, repeatability and process control—for 50 Ω andnon-50 Ω loads.

To learn more about AE’s new line of ParamountRF power systems during SEMICON West, visit the company in booth #2202in the South Hall at Moscone Convention Center in San Francisco and visit www.advanced-energy.co.jp/jp/Paramount.html. Editors interested in meeting with AE during the show may contact Angie Kellen by phone: 650.968.8900 x120, or email: akellen@mcapr.com.

About Advanced Energy^®

Advanced Energy^® develops innovative power and control technologies that drive high-growth, plasma thin-film manufacturing processes worldwide, including semiconductors, flat panel displays, data storage products, solar cells, architectural glass, and other advanced product applications.

AE^®’s product portfolio includes precise, flexible power systems; reliable gas and liquid flow-management systems; accurate thermal instruments; and global support services. Leveraging this focused product portfolio and technology leadership, AE creates solutions that maximize process impact, improve productivity, and lower cost of ownership for its customers, including original equipment manufacturers (OEMs) and end-users around the world.

AE operates in regional centers in North America, Asia, and Europe and offers global sales and support through direct offices, representatives, and distributors. Founded in 1981, AE is a publicly held company traded on NasdaqGM under the symbol AEIS. For more information, go to www.advanced-energy.com.  

Advanced Energy^®, AE^® and Paramount™ are trademarks of Advanced Energy Industries, Inc.
SEMICON^® is a trademark of Semiconductor Equipment and Materials International (SEMI).