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2012年  2011年  2010年  2009年  2008年  2007年  2006年  2005年  2004年 
2003年  2002年  2001年  2000年

2012年


Next-Generation Arc Management: Precision DC Power Solutions to Manage Arcs for new Materials in Thin-Film PVD Applications
Society of Vacuum Coaters Inc., May 2012

Advances in Power Supplies for High Arc Rate Applications
Society of Vacuum Coaters Inc., May 2012

The Pulsed-DC Advantage: Improve Film Quality and Reduce Downtime in Reactive Sputtering Applications
Society of Vacuum Coaters Inc., May 2012

2011年


The Effects of Process Power on Arc Rate and Nodule Formation during Sputtering of Aluminum-Doped Zinc Oxide
Society of Vacuum Coaters Inc., April 2011

Factors in Arc Parameter Selection on Large Scale Deposition Processes
Society of Vacuum Coaters Inc., April 2011

Advancements in PVD Power Delivery Management
Inter PV, February 2011

2010年


Electrically Stable
Solar PV Management, 2010

Inverter Cost Analysis: The Right Metrics For Improved Payback
Solar Industry, July 2010

Commercial Grid-Direct PV System
SolarPro, April/May 2010

Managing Arcs for Optimum Deposition Performance
Society of Vacuum Coaters Inc., April 2010

Multi-Megawatt Systems in North America
Photon International, February 2010

2009年


Voltage Control for Reactive Sputtering: Improving Typical Sputter Rate while Dramatically Reducing Input Power Requirements
Society of Vacuum Coaters Inc., April 2009

Transformerless Inverters Maximize Power, Reduce System Complexity
Photovoltaics World, July 2009

Transformerless Inverters Open Up Greater Freedom in PV Installations
Inter PV, July 2009

Detecting and Preventing Instabilities in Plasma Processes
Society of Vacuum Coaters Inc., May 2009

2008年


Issues and Solutions for Dealing With a Highly Capacitive Transmission Cable
Society of Vacuum Coaters Inc., April 2008

Arc Prevention in Magnetron Sputtering Processes
Society of Vacuum Coaters Inc., April 2008

Optimising performance by Integrating RF Power and Match Technologies
Euro Asia Semiconductor, December 2007/January 2008

2007年


Arc Reduction in Magnetron Sputtering of Metallic Materials
Vacuum & Coating Technology, October 2007

Target Utilization in Pulsed-DC Sputtering Processes
Society of Vacuum Coaters Inc., April 2007

Sputter Process Enhancement Through Pulsed-DC Power
Society of Vacuum Coaters Inc., April 2007

2006年


Managing Arcs in RF Powered Plasma Processes
Vacuum & Coating Technology, December 2006

The Impact of Power Supply Arc Response on Production Yield and Field Reliability
Society of Vacuum Coaters Inc., April 2006

2005年


Arc Handling Considerations for DC Sputtering Power Supplies
Society of Vacuum Coaters Inc., April 2005

2004年


Effective Closed-Loop Control for Reactive Sputtering Using Two Reactive Gases
Society of Vacuum Coaters Inc., April 2004

Stabilizing RF Generator and Plasma Interactions
Society of Vacuum Coaters, April 2004

2003年


Control of the Reactive Sputtering Process Using Two Reactive Gases
Society of Vacuum Coaters Inc., May 2003

Power System Requirements for Enhanced Mid-Frequency Process Stability
Society of Vacuum Coaters Inc., May 2003

Mid-Frequency Dual Magnetron Reactive Co-Sputtering for Deposition of Customized Index Optical Films
Society of Vacuum Coaters Inc., May 2003

2002年


Parameter Optimization in Pulsed DC Reactive Sputter Deposition of Aluminum Oxide
Society of Vacuum Coaters, Inc., April 2002

Reactively Sputtering High on the Transition Curve Using a Few Inexpensive Components
Society of Vacuum Coaters, Inc., April 2002

Substrate Response During Dual Bipolar Pulsed Magnetron Sputtering
Society of Vacuum Coaters, Inc., April 2002

A New Generation of Power Supplies for Large Area Dual Magnetron Sputtering
Vacuum & Coating Technology, April 2002

2001年


Reactive Sputtering Using a Dual-Anode Magnetron System
Society of Vacuum Coaters, Inc., April 2001 

2000年


Single-Magnetron Approach Reactive Sputtering of Dielectrics
Vacuum & Coating Technology, September 2000

Pulsed-DC Reactive Sputtering of Dielectrics: Pulsing Parameter Effects
Society of Vacuum Coaters, Inc., April 2000


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